- tungsten deposition
- tungsten deposition LICHT Wolframabscheidung f
English-German dictionary of Electrical Engineering and Electronics. 2013.
tungsten deposition
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Tungsten(III) oxide — (W2O3) is a compound of tungsten and oxygen. It has been reported (2006) as being grown as an atomic layer at temperatures between 140 240 °C using W2(N(CH3)2)6 as a precursor. [Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from… … Wikipedia
Tungsten carbide — Chembox new Name = Tungsten carbide ImageFile = Tungsten carbide.jpg ImageName = Tungsten carbide milling bits Section1 = Chembox Identifiers CASNo = 12070 12 1 Section2 = Chembox Properties Formula = WC MolarMass = 195.86 g·mol−1 Appearance =… … Wikipedia
Tungsten(VI) fluoride — Chembox new ImageFileL1 = Tungsten(VI) fluoride.jpg ImageSizeL1 = 100px ImageNameL1 = Tungsten(VI) fluoride ImageFileR1 = Tungsten hexafluoride 3D balls.png ImageSizeR1 = 100px ImageNameR1 = Ball and stick model of tungsten hexafluoride IUPACName … Wikipedia
Tungsten disilicide — Chembox new Name = Tungsten(IV) silicide ImageFile = ImageName = Tungsten disilicide OtherNames = Section1 = Chembox Identifiers CASNo = 12039 88 2 Section2 = Chembox Properties Formula = WSi2 MolarMass = 240.02 g/mol Appearance = blue odorless… … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Hexamethyl tungsten — Chembox new Name = Hexamethyl tungsten ImageFile = Hexamethyltungsten 2D dimensions.png ImageName = Hexamethyl tungsten ImageFileL1 = Hexamethyl tungsten 3D balls.png ImageNameL1 = Ball and stick model of hexamethyl tungsten ImageFileR1 =… … Wikipedia
Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Plasma Enhanced Chemical Vapour Deposition — Plasma Enhanced Chemical Vapour Deposition, PECVD or sometimes PCVD, is the process by which chemicals are deposited onto a substrate using a Radio Frequency (RF) Plasma to split the precursors into active ions.TheoryPrecursor chemical enter the… … Wikipedia
